I. Instrument Applications
The X-ray Photoelectron Spectrometer (XPS) is primarily used for the analysis of elemental composition and chemical states of material surfaces and near-surface regions (typically within a few nanometers). The instrument enables qualitative and quantitative elemental analysis and, through high-resolution spectra, allows investigation of chemical bonding states, valence state changes, and surface chemical environments of elements. Combined with ion etching techniques, it can also perform depth-dependent compositional analysis, achieving depth profiling of surface and interfacial structures. It is widely applied in the fields of new energy materials, catalytic materials, semiconductors, functional materials, and surface science. The system is equipped with UPS, a dual-anode X-ray source (Zr/Mg), and a sample vacuum/inert atmosphere transfer device.
II. Key Technical Specifications
1. Energy resolution: FWHM ≤ 0.48 eV for the Ag 3d₅/₂ peak.
2. Micro-area analysis (X-ray beam spot ≤ 10 µm) energy resolution and sensitivity: For the Ag 3d₅/₂ peak, at energy resolution ≤ 0.6 eV, count rate intensity ≥ 50 Kcps with analysis power < 1.3 W.
3. Monochromatized X-ray source system: Al Kα monochromatized X-ray source; the X-ray source is focusable and scannable. Minimum spectral acquisition beam spot ≤ 5.0 µm; capable of spectral acquisition, imaging, and depth profiling.
4. SXI secondary electron imaging precise positioning system: SXI spatial resolution ≤ 5.0 µm; enables zero-error positioning of XPS analysis samples.
5. Argon monatomic ion gun: Energy range: 0–5 keV, continuously adjustable.
6. Argon gas cluster ion beam (GCIB): Beam current ≥ 20 nA @ 20 keV.
7. Ultraviolet Photoelectron Spectroscopy (UPS): Sensitivity and energy resolution: He I sensitivity @ Ag 4d ≥ 3 Mcps; energy resolution ≤ 100 meV.
8. Dual-anode X-ray source (Zr/Mg): Mg anode sensitivity for Ag 3d₅/₂ ≥ 1.5 Mcps @ 1.40 eV.
9. Sample vacuum/inert gas protective transfer stage.
III. Sample Requirements
Please ensure that samples meet the following requirements:
Samples have been vacuum-dried;
Samples are not prone to volatilization under vacuum or high vacuum;
Samples contain no corrosive substances;
Samples contain no magnetic materials;
Samples contain no radioactive substances;
Samples contain no water of crystallization, and the samples themselves are not hygroscopic;
Samples contain no elemental sulfur or elemental iodine;
Samples are not flammable or explosive.
If samples violate the relevant regulations of this laboratory and cause damage to the instrument or the laboratory, the sample submitter shall bear full responsibility.
Before submitting samples, please verify the properties of your samples and carefully read the requirements on the sample submission form to ensure that the samples comply with the regulations of this laboratory — particularly samples that are magnetic or prone to volatilization under vacuum or ultra-high vacuum. If such samples require XPS testing, please be sure to inform the laboratory staff to confirm whether XPS testing can be performed.
